Publication:

Atomic-layer deposition of lutetium aluminate thin films for non-volatile memory applications

Date

2011
Proceedings Paper
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dc.contributor.authorAdelmann, Christoph
dc.contributor.authorSwerts, Johan
dc.contributor.authorConard, Thierry
dc.contributor.authorBrijs, Bert
dc.contributor.authorFranquet, Alexis
dc.contributor.authorHardy, An
dc.contributor.authorTielens, Hilde
dc.contributor.authorOpsomer, Karl
dc.contributor.authorMoussa, Alain
dc.contributor.authorVan Bael, Marlies
dc.contributor.authorJurczak, Gosia
dc.contributor.authorKittl, Jorge
dc.contributor.authorVan Elshocht, Sven
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorHardy, An
dc.contributor.imecauthorTielens, Hilde
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorVan Bael, Marlies
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecVan Bael, Marlies::0000-0002-5516-7962
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-19T12:28:21Z
dc.date.available2021-10-19T12:28:21Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18447
dc.source.beginpage473
dc.source.conferenceChina Semiconductor Technology International Conference - CSTIC
dc.source.conferencedate13/03/2011
dc.source.conferencelocationShanghai China
dc.source.endpage478
dc.title

Atomic-layer deposition of lutetium aluminate thin films for non-volatile memory applications

dc.typeProceedings paper
dspace.entity.typePublication
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