Towards high NA patterning readiness: Materials, processes and etch transfer for P24 Line Space

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Author(s)

Santaclara, J. G.

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;

;

Franke, Joern-Holger

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Schleicher, Filip

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Bezard, Philippe

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Hendrickx, Eric

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Journal

Proceedings of SPIE

Metrics

1701 since deposited on 2022-05-22

Acq. date: 2025-10-25