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Vertically stacked gate-all-around Si nanowire CMOS transistors with dual work function metal gates
Publication:
Vertically stacked gate-all-around Si nanowire CMOS transistors with dual work function metal gates
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Date
2016
Proceedings Paper
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Mertens, Hans
;
Ritzenthaler, Romain
;
Vaisman Chasin, Adrian
;
Schram, Tom
;
Kunnen, Eddy
;
Hikavyy, Andriy
;
Ragnarsson, Lars-Ake
;
Dekkers, Harold
;
Hopf, Toby
;
Wostyn, Kurt
;
Devriendt, Katia
;
Chew, Soon Aik
;
Kim, Min-Soo
;
Kikuchi, Yoshiaki
;
Rosseel, Erik
;
Mannaert, Geert
;
Kubicek, Stefan
;
Demuynck, Steven
;
Dangol, Anish
;
Bosman, Niels
;
Geypen, Jef
;
Carolan, Patrick
;
Bender, Hugo
;
Barla, Kathy
;
Horiguchi, Naoto
;
Mocuta, Dan
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since deposited on 2021-10-23
Acq. date: 2026-07-15
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since deposited on 2021-10-23
Acq. date: 2026-07-15
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2
since deposited on 2021-10-23
Acq. date: 2026-07-15
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2026
since deposited on 2021-10-23
Acq. date: 2026-07-15
Citations