Publication:

Physical characterization of HfO2 deposited on Ge substrates by MOCVD

Date

2003

Proceedings Paper

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Author(s)

Van Elshocht, Sven

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;

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Conard, Thierry

;

De Gendt, Stefan

;

Kubicek, Stefan

;

;

;

Richard, Olivier

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;

Van Steenbergen, Jan

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;

Metrics

1796 since deposited on 2021-10-15

Acq. date: 2025-12-15