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Physical resist models and their calibration: their readiness for accurate EUV lithography simulation
Publication:
Physical resist models and their calibration: their readiness for accurate EUV lithography simulation
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Date
2010
Proceedings Paper
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20419.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Klostermann, Ulrich K.
;
Muelders, Thomas
;
Schmoeller, Thiomas
;
Lorusso, Gian
;
Hendrickx, Eric
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1848
since deposited on 2021-10-18
Acq. date: 2025-12-11
Citations
Metrics
Views
1848
since deposited on 2021-10-18
Acq. date: 2025-12-11
Citations