Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Conference contributions
Physical resist models and their calibration: their readiness for accurate EUV lithography simulation
Publication:
Physical resist models and their calibration: their readiness for accurate EUV lithography simulation
Date
2010
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
20419.pdf
1.27 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Klostermann, Ulrich K.
;
Muelders, Thomas
;
Schmoeller, Thiomas
;
Lorusso, Gian
;
Hendrickx, Eric
Journal
Abstract
Description
Metrics
Views
1845
since deposited on 2021-10-18
411
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations
Metrics
Views
1845
since deposited on 2021-10-18
411
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations