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Negative bias temperature instability (NBTI) in SiO2 and SiON gate dielectrics understood through disorder-controlled kinetics
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Negative bias temperature instability (NBTI) in SiO2 and SiON gate dielectrics understood through disorder-controlled kinetics
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Date
2005-06
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kaczer, Ben
;
Arkhipov, Vladimir
;
Jurczak, Gosia
;
Groeseneken, Guido
Journal
Microelectronic Engineering
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1832
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Acq. date: 2025-12-16
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Views
1832
since deposited on 2021-10-16
4
last month
Acq. date: 2025-12-16
Citations