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Articles
Ni fully silicided gates for 45 nm CMOS applications
Publication:
Ni fully silicided gates for 45 nm CMOS applications
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Date
2005
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kittl, Jorge
;
Lauwers, Anne
;
Kmieciak, Malgorzata
;
Van Dal, Mark
;
Veloso, Anabela
;
Kottantharayil, Anil
;
Pourtois, Geoffrey
;
Demeurisse, Caroline
;
Schram, Tom
;
Brijs, Bert
;
de Potter de ten Broeck, Muriel
;
Vrancken, Christa
;
Maex, Karen
Journal
Microelectronic Engineering
Abstract
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Views
1943
since deposited on 2021-10-16
3
last month
3
last week
Acq. date: 2026-08-03
Citations