Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Articles
Ni fully silicided gates for 45 nm CMOS applications
Publication:
Ni fully silicided gates for 45 nm CMOS applications
Copy permalink
Date
2005-08
Journal article
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
10710.pdf
1.41 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kittl, Jorge
;
Lauwers, Anne
;
Kmieciak, Malgorzata
;
Van Dal, Mark
;
Veloso, Anabela
;
Kottantharayil, Anil
;
Pourtois, Geoffrey
;
Demeurisse, Caroline
;
Schram, Tom
;
Brijs, Bert
;
de Potter de ten Broeck, Muriel
;
Vrancken, Christa
;
Maex, Karen
Journal
Microelectronic Engineering
Abstract
Description
Metrics
Views
1932
since deposited on 2021-10-16
Acq. date: 2025-12-11
Citations
Metrics
Views
1932
since deposited on 2021-10-16
Acq. date: 2025-12-11
Citations