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Conference contributions
C2H4-based plasma-assisted CD shrink and contact patterning for RRAM application
Publication:
C2H4-based plasma-assisted CD shrink and contact patterning for RRAM application
Date
2010
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Milenin, Alexey
;
Lisoni, Judit
;
Jossart, Nico
;
Jurczak, Gosia
;
Struyf, Herbert
;
Shamiryan, Denis
;
Brouri, Mohand
;
Boullart, Werner
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2100
since deposited on 2021-10-18
Acq. date: 2025-10-22
Citations
Metrics
Views
2100
since deposited on 2021-10-18
Acq. date: 2025-10-22
Citations