Publication:
The door opener for EUV mask repair
Date
| dc.contributor.author | Waiblinger, Markus | |
| dc.contributor.author | Jonckheere, Rik | |
| dc.contributor.author | Bret, Tristan | |
| dc.contributor.author | Van Den Heuvel, Dieter | |
| dc.contributor.author | Baur, C | |
| dc.contributor.author | Baralia, G | |
| dc.contributor.imecauthor | Jonckheere, Rik | |
| dc.contributor.imecauthor | Van Den Heuvel, Dieter | |
| dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
| dc.date.accessioned | 2021-10-20T18:45:28Z | |
| dc.date.available | 2021-10-20T18:45:28Z | |
| dc.date.issued | 2012 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/21825 | |
| dc.source.beginpage | 84410F | |
| dc.source.conference | Photomask and Next-Generation Lithography Mask Technology XIX | |
| dc.source.conferencedate | 17/04/2012 | |
| dc.source.conferencelocation | Yokohama Japan | |
| dc.title | The door opener for EUV mask repair | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |