Publication:
Ultra low-k etching by neutral beams produced from CF4/Ar and SF6/Ar ICP plasmas
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1910 since deposited on 2021-10-23
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Acq. date: 2026-08-08
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1910 since deposited on 2021-10-23
2last month
1last week
Acq. date: 2026-08-08
Citations