Publication:

Challenges for atomic layer deposition in CMOS devices with high-mobility channel materials

Date

2009
Proceedings Paper
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dc.contributor.authorDelabie, Annelies
dc.contributor.authorAlian, AliReza
dc.contributor.authorBellenger, Florence
dc.contributor.authorCaymax, Matty
dc.contributor.authorConard, Thierry
dc.contributor.authorFranquet, Alexis
dc.contributor.authorSioncke, Sonja
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorHeyns, Marc
dc.contributor.authorMeuris, Marc
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorAlian, AliReza
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorMeuris, Marc
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-10-17T21:54:38Z
dc.date.available2021-10-17T21:54:38Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15216
dc.source.conferenceBaltic Conference on Atomic Layer Deposition - BALD
dc.source.conferencedate15/06/2009
dc.source.conferencelocationUppsala Sweden
dc.title

Challenges for atomic layer deposition in CMOS devices with high-mobility channel materials

dc.typeProceedings paper
dspace.entity.typePublication
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