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Impact of precursors in the atomic layer deposition of high-k dielectrics on semiconductor substrates

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dc.contributor.authorDelabie, Annelies
dc.contributor.authorNyns, Laura
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorCaymax, Matty
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorBrunco, David
dc.contributor.authorSwerts, Johan
dc.contributor.authorMaes, Jan Willem
dc.contributor.authorKim, Eunji
dc.contributor.authorMcIntyre, Paul
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorSwerts, Johan
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-17T06:52:35Z
dc.date.available2021-10-17T06:52:35Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13651
dc.source.beginpage139
dc.source.conferenceChina Semiconductor Material International Conference - CSMIC
dc.source.conferencedate19/03/2008
dc.source.conferencelocationShanghai China
dc.source.endpage141
dc.title

Impact of precursors in the atomic layer deposition of high-k dielectrics on semiconductor substrates

dc.typeMeeting abstract
dspace.entity.typePublication
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