Publication:
EUV scanner printability evaluation of natural blank defects detected by actinic blank inspection
Date
| dc.contributor.author | Takagi, Noriaki | |
| dc.contributor.author | Watanabe, Hidehiro | |
| dc.contributor.author | Van Den Heuvel, Dieter | |
| dc.contributor.author | Jonckheere, Rik | |
| dc.contributor.author | Gallagher, Emily | |
| dc.contributor.imecauthor | Van Den Heuvel, Dieter | |
| dc.contributor.imecauthor | Jonckheere, Rik | |
| dc.contributor.imecauthor | Gallagher, Emily | |
| dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
| dc.contributor.orcidimec | Gallagher, Emily::0000-0002-2927-8298 | |
| dc.date.accessioned | 2021-10-22T23:24:02Z | |
| dc.date.available | 2021-10-22T23:24:02Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2015-07 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/25974 | |
| dc.identifier.url | http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2397264 | |
| dc.source.beginpage | 96580F | |
| dc.source.conference | Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII | |
| dc.source.conferencedate | 20/04/2015 | |
| dc.source.conferencelocation | Yokohama Japan | |
| dc.title | EUV scanner printability evaluation of natural blank defects detected by actinic blank inspection | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | Original bundle
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| Publication available in collections: |