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imec's iN5 BEOL patterning development

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dc.contributor.authorLi, Waikin
dc.contributor.authorMao, Ming
dc.contributor.authorTrivkovic, Darko
dc.contributor.authorMurdoch, Gayle
dc.contributor.authorHalder, Sandip
dc.contributor.authorErcken, Monique
dc.contributor.imecauthorLi, Waikin
dc.contributor.imecauthorMao, Ming
dc.contributor.imecauthorTrivkovic, Darko
dc.contributor.imecauthorMurdoch, Gayle
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorErcken, Monique
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.date.accessioned2021-10-24T07:51:13Z
dc.date.available2021-10-24T07:51:13Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28807
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedate11/09/2017
dc.source.conferencelocationMonterey, CA USA
dc.title

imec's iN5 BEOL patterning development

dc.typeProceedings paper
dspace.entity.typePublication
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