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Difference in the nonlinear optical response of epitaxial Si on Ge(100) grown from SiH4 at 500°C and from Si3H8 at 350°C due to segregation of Ge
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Difference in the nonlinear optical response of epitaxial Si on Ge(100) grown from SiH4 at 500°C and from Si3H8 at 350°C due to segregation of Ge
Date
2009
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Valev, V.K.
;
Leys, Frederik
;
Caymax, Matty
;
Verbiest, T.
Journal
Applied Physics Letters
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1966
since deposited on 2021-10-18
1
last month
Acq. date: 2025-12-08
Citations
Metrics
Views
1966
since deposited on 2021-10-18
1
last month
Acq. date: 2025-12-08
Citations