Top-coats for scalable Nano-manufacturing with High-chi Block Copolymers in Lithographic Applications

Chevalier, Xavier; Correia, Cindy Gomez; Pound-Lana, Gwenaelle; Bezard, Philippe; Serege, Matthieu; Petit-Etienne, Camille; Gay, Guillaume; Cunge, Gilles; Cabannes-Boue, Benjamin; Nicolet, Celia; Navarro, Christophe; Cayrefourcq, Ian; Mueller, Marcus; Hadziioannou, Georges; Iliopoulos, Ilias; Fleury, Guillaume; Zelsmann, Marc

doi:10.1117/12.2583717

Publication:

Top-coats for scalable Nano-manufacturing with High-chi Block Copolymers in Lithographic Applications

Date

2021

Proceedings Paper

https://doi.org/10.1117/12.2583717

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Author(s)

Chevalier, Xavier

;

Correia, Cindy Gomez

;

Pound-Lana, Gwenaelle

;

Bezard, Philippe

;

Serege, Matthieu

;

Petit-Etienne, Camille

;

Gay, Guillaume

;

Cunge, Gilles

;

Cabannes-Boue, Benjamin

;

;

;

;

;

Hadziioannou, Georges

;

Iliopoulos, Ilias

;

Fleury, Guillaume

;

Zelsmann, Marc

Journal

Proceedings of SPIE

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Acq. date: 2026-02-25

1150 since deposited on 2023-06-20

Acq. date: 2026-02-25

Top-coats for scalable Nano-manufacturing with High-chi Block Copolymers in Lithographic Applications

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