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Process modeling for doped regions formation on high efficiency crystalline silicon solar cells

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dc.contributor.authorFlorakis, Antonios
dc.contributor.authorJanssens, Tom
dc.contributor.authorPoortmans, Jef
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.accessioned2021-10-22T01:30:30Z
dc.date.available2021-10-22T01:30:30Z
dc.date.issued2014
dc.identifier.issn1569-8025
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23826
dc.identifier.urlhttp://rd.springer.com/article/10.1007%2Fs10825-013-0487-2#-013-0487-2
dc.source.beginpage95
dc.source.endpage107
dc.source.journalJournal of Computational Electronics
dc.source.volume13
dc.title

Process modeling for doped regions formation on high efficiency crystalline silicon solar cells

dc.typeJournal article
dspace.entity.typePublication
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