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Metal-organic chemical vapor deposition of Ti-doped NiO layers for application in resistive switching memories
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Metal-organic chemical vapor deposition of Ti-doped NiO layers for application in resistive switching memories
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Date
2010
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Meersschaut, Johan
;
Toeller, Michael
;
Schaekers, Marc
;
Wang, Xin Peng
;
Brijs, Bert
;
Wouters, Dirk
;
Jurczak, Gosia
;
Altimime, Laith
;
Van Elshocht, Sven
;
Vancoille, Eric
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1929
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Acq. date: 2026-01-07
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1929
since deposited on 2021-10-18
3
last month
Acq. date: 2026-01-07
Citations