Publication:

Atomic layer deposition of ruthenium for advanced interconnect applications

Date

2016
Meeting abstract
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dc.contributor.authorAdelmann, Christoph
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorGroven, Benjamin
dc.contributor.authorWen, Liang Gong
dc.contributor.authorDutta, Shibesh
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorTokei, Zsolt
dc.contributor.authorVan Elshocht, Sven
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorGroven, Benjamin
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecGroven, Benjamin::0000-0002-5781-7594
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-23T10:04:13Z
dc.date.available2021-10-23T10:04:13Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26267
dc.source.beginpagePMT-08
dc.source.conferenceMaterials for Advanced Metalization Conference - MAM
dc.source.conferencedate20/03/2016
dc.source.conferencelocationBrussels Belgium
dc.title

Atomic layer deposition of ruthenium for advanced interconnect applications

dc.typeMeeting abstract
dspace.entity.typePublication
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