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Characterization of TaCl5-based ALD TaN films in metal gate stacks
Publication:
Characterization of TaCl5-based ALD TaN films in metal gate stacks
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Date
2018
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Dekkers, Harold
;
Ragnarsson, Lars-Ake
;
Schram, Tom
;
Horiguchi, Naoto
Journal
Journal of Applied Physics
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1922
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Acq. date: 2025-12-16
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Views
1922
since deposited on 2021-10-25
1
last month
Acq. date: 2025-12-16
Citations