Publication:
Scanning electron microscopy-based automatic defect inspection for semiconductor manufacturing: a systematic review
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0000-0003-4308-0381 | |
| cris.virtual.orcid | 0000-0001-9021-2469 | |
| cris.virtual.orcid | 0000-0002-0886-137X | |
| cris.virtualsource.department | 88d4cdb2-8ec4-4aa4-87ee-9719850d7416 | |
| cris.virtualsource.department | bf0a7c89-b35e-4250-9176-f7cfcafb8058 | |
| cris.virtualsource.department | 618c7dcf-d19e-467b-8ef0-ea4d90b44eb8 | |
| cris.virtualsource.orcid | 88d4cdb2-8ec4-4aa4-87ee-9719850d7416 | |
| cris.virtualsource.orcid | bf0a7c89-b35e-4250-9176-f7cfcafb8058 | |
| cris.virtualsource.orcid | 618c7dcf-d19e-467b-8ef0-ea4d90b44eb8 | |
| dc.contributor.author | Dehaerne, Enrique | |
| dc.contributor.author | Dey, Bappaditya | |
| dc.contributor.author | Blanco, Victor | |
| dc.contributor.author | Davis, Jesse | |
| dc.contributor.imecauthor | Dehaerne, Enrique | |
| dc.contributor.imecauthor | Dey, Bappaditya | |
| dc.contributor.imecauthor | Blanco, Victor | |
| dc.contributor.orcidimec | Dehaerne, Enrique::0000-0001-9021-2469 | |
| dc.contributor.orcidimec | Dey, Bappaditya::0000-0002-0886-137X | |
| dc.contributor.orcidimec | Blanco, Victor::0000-0003-4308-0381 | |
| dc.date.accessioned | 2025-08-03T03:58:49Z | |
| dc.date.available | 2025-08-03T03:58:49Z | |
| dc.date.issued | 2025-APR 1 | |
| dc.description.wosFundingText | We thank the reviewers for their valuable feedback, which has significantly improved this review paper. Jesse Davis acknowledges the funding from the Flemish Government under the "Onderzoeksprogramma Artificiele Intelligentie (AI) Vlaanderen" program. Microsoft 365 Copilot Chat was utilized to provide language and grammar correction suggestions throughout this manuscript. All outputs generated by the model were manually verified before being included in the final version. | |
| dc.identifier.doi | 10.1117/1.JMM.24.2.020901 | |
| dc.identifier.issn | 1932-5150 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/46024 | |
| dc.publisher | SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | |
| dc.source.beginpage | 020901-1 | |
| dc.source.endpage | 020901-28 | |
| dc.source.issue | 2 | |
| dc.source.journal | JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 | |
| dc.source.numberofpages | 28 | |
| dc.source.volume | 24 | |
| dc.subject.keywords | NEURAL-NETWORK APPROACH | |
| dc.subject.keywords | CLASSIFICATION | |
| dc.subject.keywords | CONTRAST | |
| dc.subject.keywords | VOLTAGE | |
| dc.title | Scanning electron microscopy-based automatic defect inspection for semiconductor manufacturing: a systematic review | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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