Publication:

Large marginal 2D self-aligned via patterning for sub-5nm technology

Date

2017

Proceedings Paper

https://doi.org/10.1117/12.2257924

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37554.pdf 967.13 KB

Author(s)

;

;

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Debacker, Peter

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Raghavan, Praveen

;

Kim, Ryan Ryoung han

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Metrics

1963 since deposited on 2021-10-24

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Acq. date: 2025-12-18