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Electrochemical nucleation and growth of copper on resistive substrates

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dc.contributor.authorRadisic, Alex
dc.contributor.authorBoelen, Pieter
dc.contributor.authorRosenfeld, Aron
dc.contributor.authorHernandez, Jose Luis
dc.contributor.authorBeyer, Gerald
dc.contributor.authorVereecken, Philippe
dc.contributor.imecauthorRadisic, Alex
dc.contributor.imecauthorHernandez, Jose Luis
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorVereecken, Philippe
dc.contributor.orcidimecVereecken, Philippe::0000-0003-4115-0075
dc.date.accessioned2021-10-16T18:51:36Z
dc.date.available2021-10-16T18:51:36Z
dc.date.embargo9999-12-31
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12747
dc.identifier.urlhttp://ecsmeet6.peerx-press.org/ms_files/ecsmeet6/2007/05/09/00000388/00/388_0_art_0_jhrn5b.pdf
dc.source.beginpage1375
dc.source.conference212th ECS Fall Meeting
dc.source.conferencedate7/10/2007
dc.source.conferencelocationWashington, DC USA
dc.title

Electrochemical nucleation and growth of copper on resistive substrates

dc.typeMeeting abstract
dspace.entity.typePublication
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