Publication:

Advanced single chemistry alkaline cleaning in a STEAG single tank tool

Date

2002
Proceedings Paper
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dc.contributor.authorOnsia, Bart
dc.contributor.authorSchellkes, E.
dc.contributor.authorVos, Rita
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorDoll, O.
dc.contributor.authorFester, A.
dc.contributor.authorKolbesen, B.
dc.contributor.authorHoffman, M.
dc.contributor.authorHatcher, Z.
dc.contributor.authorWolke, K.
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorOnsia, Bart
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-14T22:39:03Z
dc.date.available2021-10-14T22:39:03Z
dc.date.embargo9999-12-31
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6678
dc.source.beginpage23
dc.source.conferenceCleaning Technology in Semiconductor Device Manufacturing VII
dc.source.conferencedate4/09/2001
dc.source.conferencelocationSan Francisco, CA USA
dc.source.endpage30
dc.title

Advanced single chemistry alkaline cleaning in a STEAG single tank tool

dc.typeProceedings paper
dspace.entity.typePublication
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