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Low-frequency noise in high-k and SiO2 UTBOX SOI nMOSFETs

Date

2013
Proceedings Paper
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dc.contributor.authorDos Santos, Sara
dc.contributor.authorMartino, Joao A.
dc.contributor.authorStrobel, Vincent
dc.contributor.authorCretu, Bogdan
dc.contributor.authorRoutoure, Jean-Marc
dc.contributor.authorCarin, Regis
dc.contributor.authorSimoen, Eddy
dc.contributor.authorAoulaiche, Marc
dc.contributor.authorJurczak, Gosia
dc.contributor.authorClaeys, Cor
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.accessioned2021-10-21T07:22:04Z
dc.date.available2021-10-21T07:22:04Z
dc.date.embargo9999-12-31
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22277
dc.identifier.urlhttp://ecst.ecsdl.org/content/52/1/87.abstract?related-urls=yes&legid=ecst;52/1/87
dc.source.beginpage87
dc.source.conferenceChina Semiconductor Technology International Conference - CSTIC
dc.source.conferencedate19/03/2013
dc.source.conferencelocationShanghai China
dc.source.endpage92
dc.title

Low-frequency noise in high-k and SiO2 UTBOX SOI nMOSFETs

dc.typeProceedings paper
dspace.entity.typePublication
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