Publication:
Quantitative measurement of pattern collapse and particle removal force
Date
| dc.contributor.author | Kim, Tae-Gon | |
| dc.contributor.author | Wostyn, Kurt | |
| dc.contributor.author | Mertens, Paul | |
| dc.contributor.author | Busnaina, Ahmed | |
| dc.contributor.author | Park, Jin-Goo | |
| dc.contributor.imecauthor | Wostyn, Kurt | |
| dc.contributor.imecauthor | Mertens, Paul | |
| dc.contributor.orcidimec | Wostyn, Kurt::0000-0003-3995-0292 | |
| dc.date.accessioned | 2021-10-16T17:06:46Z | |
| dc.date.available | 2021-10-16T17:06:46Z | |
| dc.date.issued | 2007 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/12399 | |
| dc.source.beginpage | 123 | |
| dc.source.conference | Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10 | |
| dc.source.conferencedate | 7/10/2007 | |
| dc.source.conferencelocation | Washington, DC USA | |
| dc.source.endpage | 129 | |
| dc.title | Quantitative measurement of pattern collapse and particle removal force | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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