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High-Throughput Nanopore Fabrication and Classification Using Xe-Ion Irradiation and Automated Pore-Edge Analysis

 
dc.contributor.authorMacha, Michal
dc.contributor.authorMarion, Sanjin
dc.contributor.authorTripathi, Mukesh
dc.contributor.authorThakur, Mukeshchand
dc.contributor.authorLihter, Martina
dc.contributor.authorKis, Andras
dc.contributor.authorSmolyanitsky, Alex
dc.contributor.authorRadenovic, Aleksandra
dc.contributor.imecauthorMarion, Sanjin
dc.contributor.orcidimecMarion, Sanjin::0000-0002-9892-7378
dc.date.accessioned2023-04-27T13:49:20Z
dc.date.available2022-10-10T02:47:48Z
dc.date.available2023-04-27T13:49:20Z
dc.date.issued2022
dc.description.wosFundingTextThis work was in part financially supported by Swiss National Science Foundation (SNSF) support through 200021_192037 and the CCMX Materials Challenge grant ?Large area growth of 2D materials for device integration?. A.S. gratefully acknowledges support from the Materials Genome Initiative.
dc.identifier.doi10.1021/acsnano.2c05201
dc.identifier.issn1936-0851
dc.identifier.pmidMEDLINE:36153997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40546
dc.publisherAMER CHEMICAL SOC
dc.source.beginpage16249
dc.source.endpage16259
dc.source.issue10
dc.source.journalACS NANO
dc.source.numberofpages11
dc.source.volume16
dc.subject.keywordsMOS2
dc.subject.keywordsFIELD
dc.subject.keywordsSELECTIVITY
dc.title

High-Throughput Nanopore Fabrication and Classification Using Xe-Ion Irradiation and Automated Pore-Edge Analysis

dc.typeJournal article
dspace.entity.typePublication
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