Publication:

Interface/bulk trap recovery after submeltl aser anneal and the impact to NBTI reliability

Date

2010
Journal article
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dc.contributor.authorCho, Moon Ju
dc.contributor.authorAoulaiche, Marc
dc.contributor.authorDegraeve, Robin
dc.contributor.authorOrtolland, Claude
dc.contributor.authorKauerauf, Thomas
dc.contributor.authorKaczer, Ben
dc.contributor.authorRoussel, Philippe
dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.authorGroeseneken, Guido
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.date.accessioned2021-10-18T15:35:14Z
dc.date.available2021-10-18T15:35:14Z
dc.date.issued2010
dc.identifier.issn0741-3106
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16866
dc.source.beginpage606
dc.source.endpage608
dc.source.issue6
dc.source.journalIEEE Electron Device Letters
dc.source.volume31
dc.title

Interface/bulk trap recovery after submeltl aser anneal and the impact to NBTI reliability

dc.typeJournal article
dspace.entity.typePublication
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