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Kinetics of Ni3Si2 formation in the Ni2Si-NiSi thin film reaction from in situ measurements

Date

2007
Journal article
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dc.contributor.authorKittl, Jorge
dc.contributor.authorPawlak, Malgorzata
dc.contributor.authorTorregiani, Cristina
dc.contributor.authorLauwers, Anne
dc.contributor.authorDemeurisse, Caroline
dc.contributor.authorVrancken, Christa
dc.contributor.authorAbsil, Philippe
dc.contributor.authorBiesemans, Serge
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorJordan-Sweet, Jean
dc.contributor.authorLavoie, Christian
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorDemeurisse, Caroline
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorBiesemans, Serge
dc.date.accessioned2021-10-16T17:09:04Z
dc.date.available2021-10-16T17:09:04Z
dc.date.embargo9999-12-31
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12407
dc.source.beginpage232102
dc.source.issue23
dc.source.journalApplied Physics Letters
dc.source.volume91
dc.title

Kinetics of Ni3Si2 formation in the Ni2Si-NiSi thin film reaction from in situ measurements

dc.typeJournal article
dspace.entity.typePublication
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