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The advantages of vacuum deposition as a technique to grow PVV-oligomer/C60 thin films for organic solar cell applications

Date

1999
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dc.contributor.authorGeens, Wim
dc.contributor.authorPoortmans, Jef
dc.contributor.authorJain, Suresh
dc.contributor.authorNijs, Johan
dc.contributor.authorMertens, Robert
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.imecauthorMertens, Robert
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.accessioned2021-10-06T11:12:12Z
dc.date.available2021-10-06T11:12:12Z
dc.date.embargo9999-12-31
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3464
dc.source.conference10th International Workshop on the Physics of Semiconductor Devices
dc.source.conferencedate14/12/1999
dc.source.conferencelocationNew Delhi India
dc.title

The advantages of vacuum deposition as a technique to grow PVV-oligomer/C60 thin films for organic solar cell applications

dc.typeOral presentation
dspace.entity.typePublication
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