Publication:

Self-assembled monolayers as inhibitors for area-selective deposition: A novel approach towards resist-less EUV lithography

Date

2022
Journal article
https://doi.org/10.1016/j.apsusc.2022.154657
Simple item page Full metadata Statistics
 
dc.contributor.authorLodha, Jayant K.
dc.contributor.authorPollentier, Ivan
dc.contributor.authorConard, Thierry
dc.contributor.authorVallat, Remi
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorArmini, Silvia
dc.contributor.imecauthorLodha, Jayant K.
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVallat, Remi
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorArmini, Silvia
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.date.accessioned2022-11-10T15:19:37Z
dc.date.available2022-10-04T02:53:42Z
dc.date.available2022-11-10T15:19:37Z
dc.date.issued2022
dc.identifier.doi10.1016/j.apsusc.2022.154657
dc.identifier.issn0169-4332
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40532
dc.publisherELSEVIER
dc.source.beginpage154657
dc.source.endpagena
dc.source.issuena
dc.source.journalAPPLIED SURFACE SCIENCE
dc.source.numberofpages10
dc.source.volume606
dc.subject.keywordsATOMIC LAYER DEPOSITION
dc.subject.keywordsTITANIUM-DIOXIDE
dc.subject.keywordsTHIN-FILMS
dc.subject.keywordsTIO2
dc.subject.keywordsRUTHENIUM
dc.subject.keywordsPRECURSOR
dc.subject.keywordsSILICON
dc.title

Self-assembled monolayers as inhibitors for area-selective deposition: A novel approach towards resist-less EUV lithography

dc.typeJournal article
dspace.entity.typePublication
Files
Publication available in collections:
Articles