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The influence of defects on campatibility and yield of the HfO2-polysilicon gate stack for CMOS integration
Publication:
The influence of defects on campatibility and yield of the HfO2-polysilicon gate stack for CMOS integration
Date
2003
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kaushik, Vidya
;
De Gendt, Stefan
;
Carter, Richard
;
Claes, Martine
;
Röhr, Erika
;
Pantisano, Luigi
;
Kluth, Jon
;
Kerber, Andreas
;
Cosnier, Vincent
;
Cartier, Eduard
;
Tsai, Wilman
;
Young, Edward
;
Green, Martin
;
Chen, Jerry
;
Jang, S.A.
;
Lin, S.
;
Delabie, Annelies
;
Van Elshocht, Sven
;
Manabe, Yukiko
;
Richard, Olivier
;
Zhao, Chao
;
Bender, Hugo
;
Caymax, Matty
;
Heyns, Marc
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1906
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations
Metrics
Views
1906
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations