Publication:
A new route for fabricating strained Ge-based pMOSFETs
Date
| dc.contributor.author | Vincent, Benjamin | |
| dc.contributor.author | Loo, Roger | |
| dc.contributor.imecauthor | Vincent, Benjamin | |
| dc.contributor.imecauthor | Loo, Roger | |
| dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
| dc.date.accessioned | 2021-10-20T18:36:04Z | |
| dc.date.available | 2021-10-20T18:36:04Z | |
| dc.date.issued | 2012-01 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/21805 | |
| dc.identifier.url | http://chipdesignmag.com/display.php?articleId=5082&issueId=46 | |
| dc.source.beginpage | 40 | |
| dc.source.endpage | 42 | |
| dc.source.issue | Winter | |
| dc.source.journal | Chip Design Magazine | |
| dc.title | A new route for fabricating strained Ge-based pMOSFETs | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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