Publication:

Mask roughness effects on pattern variability

Date

2012
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dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorGronheid, Roel
dc.contributor.authorLorusso, Gian
dc.contributor.authorYounkin, Todd
dc.contributor.authorPei-Yang, Yan
dc.contributor.authorLeeson, Michael
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorLorusso, Gian
dc.date.accessioned2021-10-20T17:21:41Z
dc.date.available2021-10-20T17:21:41Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21660
dc.identifier.urlhttps://www.sematech.org/10258/proceedings.htm
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate30/09/2012
dc.source.conferencelocationBrussels Belgium
dc.title

Mask roughness effects on pattern variability

dc.typeOral presentation
dspace.entity.typePublication
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