Publication:
Epitaxial growth of Si and SiGe by reduced pressure CVD for device applications
Date
| dc.contributor.author | Loo, Roger | |
| dc.contributor.imecauthor | Loo, Roger | |
| dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
| dc.date.accessioned | 2021-10-14T11:29:44Z | |
| dc.date.available | 2021-10-14T11:29:44Z | |
| dc.date.issued | 1999 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3633 | |
| dc.source.conference | Workshop in the Framework of the Leuven-Budapest Bilateral Physics Collaboration; 22-23 April 1999; | |
| dc.source.conferencelocation | ||
| dc.title | Epitaxial growth of Si and SiGe by reduced pressure CVD for device applications | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
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