Publication:

Strained silicon on relaxed SiGe made by strain transfer

Date

2004
Meeting abstract
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dc.contributor.authorMantl, Siegfried
dc.contributor.authorBuca, Dan M.
dc.contributor.authorHolländer, Bernd
dc.contributor.authorTrinkaus, Helmut
dc.contributor.authorLuysberg, Martina
dc.contributor.authorHouben, L.
dc.contributor.authorCarius, Reinhard
dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.contributor.authorSchäfer, Herbert
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-15T14:43:11Z
dc.date.available2021-10-15T14:43:11Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9263
dc.source.beginpage111
dc.source.conferenceProgram and Abstracts Book 2nd International SiGe Technology and Device Meeting - ISTDM
dc.source.conferencedate17/05/2004
dc.source.conferencelocationFrankfurt am Oder Germany
dc.source.endpage112
dc.title

Strained silicon on relaxed SiGe made by strain transfer

dc.typeMeeting abstract
dspace.entity.typePublication
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