Publication:

HAXPES study of full high-k/metal gate stacks deposited on Ge substrates

Date

2013
Meeting abstract
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dc.contributor.authorFleischmann, Claudia
dc.contributor.authorKalpyris, Ioannis
dc.contributor.authorConard, Thierry
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorSioncke, Sonja
dc.contributor.authorRueff, J.P.
dc.contributor.authorAblett, J.M.
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorFleischmann, Claudia
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecFleischmann, Claudia::0000-0003-1531-6916
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.date.accessioned2021-10-21T07:39:07Z
dc.date.available2021-10-21T07:39:07Z
dc.date.embargo9999-12-31
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22352
dc.identifier.urlhttp://www2.avs.org/symposium2013/ProgramBooks/ProgramBook_Session_SA+AS+MG+SS-TuA.pdf
dc.source.beginpageTuA9
dc.source.conferenceAVS 60th International Symposium & Exhibition
dc.source.conferencedate27/10/2013
dc.source.conferencelocationLong Beach, CA USA
dc.title

HAXPES study of full high-k/metal gate stacks deposited on Ge substrates

dc.typeMeeting abstract
dspace.entity.typePublication
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