Publication:
Studies of boron diffusion in strained Si1-xGex epitaxial layers
Date
| dc.contributor.author | Krishnasamy, Rajendran | |
| dc.contributor.author | Schoenmaker, Wim | |
| dc.date.accessioned | 2021-10-14T17:40:12Z | |
| dc.date.available | 2021-10-14T17:40:12Z | |
| dc.date.issued | 2001 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5601 | |
| dc.source.beginpage | 980 | |
| dc.source.endpage | 987 | |
| dc.source.issue | 1 | |
| dc.source.journal | Journal of Applied Physics | |
| dc.source.volume | 89 | |
| dc.title | Studies of boron diffusion in strained Si1-xGex epitaxial layers | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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