Publication:

<i>In vacuo</i> XPS study: controlled ALD growth of Al<sub>2</sub>O<sub>3</sub> on metallic lithium enabled by plasma pretreatment

Date

2026
Journal article
https://doi.org/10.1039/d6ta00751a
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cris.virtual.orcid0000-0003-4115-0075
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dc.contributor.authorVerhelle, Tippi
dc.contributor.authorHenderick, Lowie
dc.contributor.authorYari, Saeed
dc.contributor.authorCoessens, Siebe
dc.contributor.authorMinjauw, Matthias M.
dc.contributor.authorDe Taeye, Louis
dc.contributor.authorVereecken, Philippe
dc.contributor.authorDendooven, Jolien
dc.contributor.authorSafari, Momo
dc.contributor.authorDetavernier, Christophe
dc.contributor.orcidext0000-0003-4115-0075
dc.date.accessioned2026-07-27T14:05:42Z
dc.date.available2026-07-27T14:05:42Z
dc.date.createdwos2026
dc.date.issued2026
dc.description.abstract Plasma pretreatments create well-defined and reproducible lithium surfaces that govern TMA reactivity, leading to precursor decomposition or ALD-like Al 2 O 3 growth.
dc.description.wosFundingTextThis work was supported by the GOA project from the Special Research Fund - UGent (01G02124) and VLAIO (Vlaams Agentschap Innoveren & Ondernemen) within the SBO project MESH-BAT (HBC.2023.0669). The authors acknowledge the financial support from Fonds Wetenschappelijk Onderzoek - Vlaanderen (FWO) for the FWO medium-sized research infrastructure project L-SCAN I003222N and for providing Tippi Verhelle with an SB grant (1SH9024N) and Lowie Henderick with a junior postdoctoral fellowship (1254324N). Siebe Coessens holds a grant (HBC.2022.0157) which is supported by VLAIO. Furthermore, a special thank you goes out to Geert Rampelberg and Stefaan Broekaert for their technical assistance and their eye for detail while developing/building the reactor used in this work and Olivier Janssens for his assistance during SEM operation.
dc.identifier.doi10.1039/d6ta00751a
dc.identifier.eissn2050-7496
dc.identifier.issn2050-7488
dc.identifier.issn2050-7496
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/59999
dc.language.isoeng
dc.provenance.editstepusergreet.vanhoof@imec.be
dc.publisherROYAL SOC CHEMISTRY
dc.source.beginpage21682
dc.source.endpage21694
dc.source.issue33
dc.source.journalJOURNAL OF MATERIALS CHEMISTRY A
dc.source.numberofpages13
dc.source.volume14
dc.subject.keywordsATOMIC LAYER DEPOSITION
dc.subject.keywordsANODES
dc.subject.keywordsPERFORMANCE
dc.subject.keywordsFILMS
dc.subject.keywordsLI
dc.title

In vacuo XPS study: controlled ALD growth of Al2O3 on metallic lithium enabled by plasma pretreatment

dc.typeJournal article
dspace.entity.typePublication
imec.internal.crawledAt2026-04-28
imec.internal.sourcecrawler
imec.internal.wosCreatedAt2026-07-14
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