Publication:

Influence of boron implantation dose on the mechanical stress in polycrystalline silicon films

Date

2000
Proceedings Paper
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dc.contributor.authorNakabayashi, M.
dc.contributor.authorIkegami, M.
dc.contributor.authorOhyama, Hidenori
dc.contributor.authorKobauashi, K.
dc.contributor.authorYoneoka, M.
dc.contributor.authorSimoen, Eddy
dc.contributor.authorClaeys, Cor
dc.contributor.authorTakami, Y.
dc.contributor.authorSunaga, H.
dc.contributor.authorTakizawa, H.
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.accessioned2021-10-14T13:26:09Z
dc.date.available2021-10-14T13:26:09Z
dc.date.embargo9999-12-31
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4605
dc.source.beginpage85
dc.source.conference3rd International Conference Materials for Microelectronics
dc.source.conferencedate16/10/2000
dc.source.conferencelocationDublin Ireland
dc.source.endpage88
dc.title

Influence of boron implantation dose on the mechanical stress in polycrystalline silicon films

dc.typeProceedings paper
dspace.entity.typePublication
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