Publication:

In-Situ HCl etching of InP in shallow-trench-isolated structures

Date

2011
Meeting abstract
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dc.contributor.authorOrzali, Tommaso
dc.contributor.authorWang, G.
dc.contributor.authorWaldron, Niamh
dc.contributor.authorMerckling, Clement
dc.contributor.authorRichard, Olivier
dc.contributor.authorBender, Hugo
dc.contributor.authorCaymax, Matty
dc.contributor.imecauthorWaldron, Niamh
dc.contributor.imecauthorMerckling, Clement
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecMerckling, Clement::0000-0003-3084-2543
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.accessioned2021-10-19T16:58:17Z
dc.date.available2021-10-19T16:58:17Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19522
dc.source.beginpage2153
dc.source.conference220th ECS Fall Meeting
dc.source.conferencedate9/10/2011
dc.source.conferencelocationBoston, MA USA
dc.title

In-Situ HCl etching of InP in shallow-trench-isolated structures

dc.typeMeeting abstract
dspace.entity.typePublication
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