Publication:

Particle removal and damage thresholds from particle removal and damage formation frequency for high-velocity-aerosol cleaning

Date

2009
Proceedings Paper
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dc.contributor.authorWostyn, Kurt
dc.contributor.authorWada, Masayuki
dc.contributor.authorAndreas, M.
dc.contributor.authorKenis, Karine
dc.contributor.authorRoussel, Philippe
dc.contributor.authorBearda, Twan
dc.contributor.authorLeunissen, Peter
dc.contributor.authorMertens, Paul
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.date.accessioned2021-10-18T05:26:01Z
dc.date.available2021-10-18T05:26:01Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16562
dc.source.beginpage211
dc.source.conferenceCleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
dc.source.endpage217
dc.title

Particle removal and damage thresholds from particle removal and damage formation frequency for high-velocity-aerosol cleaning

dc.typeProceedings paper
dspace.entity.typePublication
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