Publication:

Non-linear dielectric constant increase with Ti composition in high-k ALD-HfTiOx films after O2 crystallization annealing

Date

2009
Presentation
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dc.contributor.authorTomida, Kazuyuki
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorOpsomer, Karl
dc.contributor.authorMenou, Nicolas
dc.contributor.authorDelabie, Annelies
dc.contributor.authorSwerts, Johan
dc.contributor.authorSteenbergen, Johnny
dc.contributor.authorKaczer, Ben
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorWouters, Dirk
dc.contributor.authorKittl, Jorge
dc.contributor.imecauthorTomida, Kazuyuki
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorSteenbergen, Johnny
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-18T03:40:42Z
dc.date.available2021-10-18T03:40:42Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16316
dc.source.conferenceE-MRS Spring Meeting Symposium G: Fundamentals and Technology of Multifunctional Oxide Thin Films
dc.source.conferencedate8/06/2009
dc.source.conferencelocationStrasbourg France
dc.title

Non-linear dielectric constant increase with Ti composition in high-k ALD-HfTiOx films after O2 crystallization annealing

dc.typeOral presentation
dspace.entity.typePublication
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