Publication:
Enabling chemically amplified resists towards tight pitch EUV patterning by directed self-assembly
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0000-0003-2499-0240 | |
| cris.virtual.orcid | 0000-0003-0922-2446 | |
| cris.virtual.orcid | 0000-0003-4370-5062 | |
| cris.virtual.orcid | 0000-0002-4287-9725 | |
| cris.virtual.orcid | 0000-0002-3679-811X | |
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| cris.virtualsource.orcid | 9be55e2a-6005-4422-934e-fb2f4424fb1c | |
| dc.contributor.author | Verstraete, Lander | |
| dc.contributor.author | Vallat, Remi | |
| dc.contributor.author | Van Bel, Julie | |
| dc.contributor.author | Job, Min-Gi | |
| dc.contributor.author | Bezard, Philippe | |
| dc.contributor.author | Suh, Hyo Seon | |
| dc.contributor.imecauthor | Verstraete, Lander | |
| dc.contributor.imecauthor | Vallat, Remi | |
| dc.contributor.imecauthor | Van Bel, Julie | |
| dc.contributor.imecauthor | Job, Min-Gi | |
| dc.contributor.imecauthor | Bezard, Philippe | |
| dc.contributor.imecauthor | Suh, Hyo Seon | |
| dc.contributor.orcidimec | Verstraete, Lander::0000-0002-3679-811X | |
| dc.contributor.orcidimec | Vallat, Remi::0000-0003-0922-2446 | |
| dc.contributor.orcidimec | Van Bel, Julie::0000-0002-4287-9725 | |
| dc.contributor.orcidimec | Bezard, Philippe::0000-0003-2499-0240 | |
| dc.contributor.orcidimec | Suh, Hyo Seon::0000-0003-4370-5062 | |
| dc.date.accessioned | 2025-07-31T03:59:33Z | |
| dc.date.available | 2025-07-31T03:59:33Z | |
| dc.date.issued | 2025 | |
| dc.identifier.doi | 10.1117/12.3051663 | |
| dc.identifier.eisbn | 978-1-5106-8641-0 | |
| dc.identifier.isbn | 978-1-5106-8640-3 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/45980 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | 134270D | |
| dc.source.conference | 2025 Conference on Novel Patterning Technologies | |
| dc.source.conferencedate | 2025-04-25 | |
| dc.source.conferencelocation | San Jose | |
| dc.source.endpage | 134270D-1 | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 9 | |
| dc.title | Enabling chemically amplified resists towards tight pitch EUV patterning by directed self-assembly | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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