Publication:

Enabling chemically amplified resists towards tight pitch EUV patterning by directed self-assembly

Date

2025
Proceedings Paper
https://doi.org/10.1117/12.3051663
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dc.contributor.authorVerstraete, Lander
dc.contributor.authorVallat, Remi
dc.contributor.authorVan Bel, Julie
dc.contributor.authorJob, Min-Gi
dc.contributor.authorBezard, Philippe
dc.contributor.authorSuh, Hyo Seon
dc.contributor.imecauthorVerstraete, Lander
dc.contributor.imecauthorVallat, Remi
dc.contributor.imecauthorVan Bel, Julie
dc.contributor.imecauthorJob, Min-Gi
dc.contributor.imecauthorBezard, Philippe
dc.contributor.imecauthorSuh, Hyo Seon
dc.contributor.orcidimecVerstraete, Lander::0000-0002-3679-811X
dc.contributor.orcidimecVallat, Remi::0000-0003-0922-2446
dc.contributor.orcidimecVan Bel, Julie::0000-0002-4287-9725
dc.contributor.orcidimecBezard, Philippe::0000-0003-2499-0240
dc.contributor.orcidimecSuh, Hyo Seon::0000-0003-4370-5062
dc.date.accessioned2025-07-31T03:59:33Z
dc.date.available2025-07-31T03:59:33Z
dc.date.issued2025
dc.identifier.doi10.1117/12.3051663
dc.identifier.eisbn978-1-5106-8641-0
dc.identifier.isbn978-1-5106-8640-3
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45980
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.conference2025 Conference on Novel Patterning Technologies
dc.source.conferencedateFEB 24-27, 2025
dc.source.conferencelocationSan Jose
dc.source.numberofpages9
dc.source.volume13427
dc.title

Enabling chemically amplified resists towards tight pitch EUV patterning by directed self-assembly

dc.typeProceedings paper
dspace.entity.typePublication
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