Publication:
Roadblocks and critical aspect of cleaning for sub-65nm technologies
Date
| dc.contributor.author | Mertens, Paul | |
| dc.contributor.imecauthor | Mertens, Paul | |
| dc.date.accessioned | 2021-10-16T03:26:05Z | |
| dc.date.available | 2021-10-16T03:26:05Z | |
| dc.date.issued | 2005 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/10886 | |
| dc.source.beginpage | 95 | |
| dc.source.conference | Proceedings IEEE VLSI-TSA International Symposium on VLSI Technology | |
| dc.source.conferencedate | 25/04/2005 | |
| dc.source.conferencelocation | Hsinchu Taiwan | |
| dc.source.endpage | 96 | |
| dc.title | Roadblocks and critical aspect of cleaning for sub-65nm technologies | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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