Publication:

Wavelength tuning of photonic crystal waveguides fabricated using 248-nm deep UV lithography

Date

2004
Proceedings Paper
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dc.contributor.authorZhuang, Y.X.
dc.contributor.authorFrandsen, L.H.
dc.contributor.authorHarpoth, A.
dc.contributor.authorThorhauge, M.
dc.contributor.authorKristensen, M.
dc.contributor.authorBorel, P.I.
dc.contributor.authorBogaerts, Wim
dc.contributor.authorBaets, Roel
dc.contributor.imecauthorBogaerts, Wim
dc.contributor.imecauthorBaets, Roel
dc.contributor.orcidimecBogaerts, Wim::0000-0003-1112-8950
dc.contributor.orcidimecBaets, Roel::0000-0003-1266-1319
dc.date.accessioned2021-10-15T18:18:28Z
dc.date.available2021-10-15T18:18:28Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9986
dc.source.beginpageThR2
dc.source.conferenceOFC - The Optical Fiber and Communication Conference
dc.source.conferencedate22/02/2004
dc.source.conferencelocationLos Angeles, CA USA
dc.title

Wavelength tuning of photonic crystal waveguides fabricated using 248-nm deep UV lithography

dc.typeProceedings paper
dspace.entity.typePublication
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