Publication:

Improving Silicon-photonics inverse-design printability by leveraging SEM contours for advanced Optical Proximity Correction techniques

Date

2022
Proceedings Paper
https://doi.org/10.1117/12.2609092
Simple item page Full metadata Statistics
 
dc.contributor.authorDrissi, Youssef
dc.contributor.authorGillijns, Werner
dc.contributor.authorLardenois, Sebastien
dc.contributor.authorVerheyen, Peter
dc.contributor.authorLepage, Guy
dc.contributor.authorMohsen, Mahmoud
dc.contributor.authorDelorme, Maxence
dc.contributor.imecauthorDrissi, Youssef
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorLardenois, Sebastien
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorLepage, Guy
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecLardenois, Sebastien::0000-0001-8404-5676
dc.contributor.orcidimecVerheyen, Peter::0000-0002-8245-9442
dc.date.accessioned2023-06-05T14:47:00Z
dc.date.available2022-08-11T02:41:30Z
dc.date.available2023-06-05T14:47:00Z
dc.date.issued2022
dc.identifier.doi10.1117/12.2609092
dc.identifier.eisbn978-1-5106-4896-8
dc.identifier.isbn978-1-5106-4895-1
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40241
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage1201208
dc.source.conferenceConference on Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XV Part of SPIE Photonics West OPTO Conference
dc.source.conferencedateJAN 22-FEB 24, 2022
dc.source.conferencelocationSan Francisco
dc.source.journalProceedings of SPIE
dc.source.numberofpages10
dc.source.volume12012
dc.title

Improving Silicon-photonics inverse-design printability by leveraging SEM contours for advanced Optical Proximity Correction techniques

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions