Publication:

Calibration of PIXE yields using binary thin films on Si

Date

2014
Journal article
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dc.contributor.authorMeersschaut, Johan
dc.contributor.authorCarbonel, Jacob
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorZhao, Qiang
dc.contributor.authorVantomme, Andre
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorVantomme, Andre
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.date.accessioned2021-10-22T03:40:40Z
dc.date.available2021-10-22T03:40:40Z
dc.date.issued2014
dc.identifier.issn0168-583X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24233
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S0168583X14004820
dc.source.beginpage65
dc.source.endpage68
dc.source.journalNuclear Instruments and Methods in Physics Research B
dc.source.volume331
dc.title

Calibration of PIXE yields using binary thin films on Si

dc.typeJournal article
dspace.entity.typePublication
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