Publication:

Quantitative TOFSIMS depth profiling of ultra thin silicon oxynitride films

Date

2000
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Witte, Hilde
dc.contributor.authorSchaekers, Marc
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.date.accessioned2021-10-14T12:45:32Z
dc.date.available2021-10-14T12:45:32Z
dc.date.embargo9999-12-31
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4216
dc.source.beginpage381
dc.source.conferenceSecondary Ion Mass Spectrometry - SIMS XII. Proceedings of the 12th International Conference
dc.source.conferencedate5/09/1999
dc.source.conferencelocationBrussel Belgium
dc.source.endpage384
dc.title

Quantitative TOFSIMS depth profiling of ultra thin silicon oxynitride films

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
4197.pdf
Size:
217.6 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions