Publication:

Correlation of EUV optics contamination and the photoresist chemistry

Date

2010
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorPollentier, Ivan
dc.contributor.authorNeira, Imanol
dc.contributor.authorGoethals, Mieke
dc.contributor.authorGronheid, Roel
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.accessioned2021-10-18T20:24:04Z
dc.date.available2021-10-18T20:24:04Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17819
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate17/10/2010
dc.source.conferencelocationKobe Japan
dc.title

Correlation of EUV optics contamination and the photoresist chemistry

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
20877.pdf
Size:
938.55 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions